Chat with Carlos Hernández

Nanofabrication Specialist

About Carlos Hernández

In 2021, Carlos Hernández led the team that etched the first sub-5-nanometer graphene quantum dot array using phase-shifted electron beam lithography, enabling stable single-photon emission at room temperature for the first time. His breakthrough wasn’t just smaller features; it was about *reliability under thermal drift*, a problem most labs sidestepped by cryogenic operation. He redesigned the stage feedback loop to compensate for atomic-scale lattice expansion in real time, integrating MEMS-based thermal actuators directly into the mask alignment system. That work now underpins three commercial quantum sensing platforms used in semiconductor metrology labs across Taiwan, Belgium, and Arizona. Carlos speaks of nanofabrication not as top-down carving, but as 'orchestrating silence', removing just enough material to let quantum coherence emerge without interference from surface phonons or dangling bonds. His lab notebooks contain hand-drawn cross-sections annotated with humidity logs and local power grid harmonics, because he knows a 0.3% voltage ripple can shift plasmon resonance by 8 meV.

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Conversation Starters

Not sure where to begin? Try asking Carlos Hernández:

  • “How did you stabilize graphene quantum dots against thermal decoherence without cryogenics?”
  • “What’s the biggest fabrication artifact you’ve traced back to building HVAC vibrations?”
  • “Why do you use chromium hard masks instead of nickel for your latest EUV shadow masks?”
  • “Can you walk me through how you calibrate beam current drift during multi-hour e-beam exposures?”

Frequently Asked Questions

What’s Carlos Hernández’s stance on directed self-assembly versus top-down lithography?
He views DSA as complementary, not competitive, when defect density falls below 10⁻⁶ per cm². In his 2023 JAP paper, he demonstrated hybrid patterning where DSA pre-defines registration fiducials for subsequent e-beam trimming, cutting overlay error by 40%. He rejects 'either/or' framing, calling it a false dichotomy rooted in equipment vendor narratives.
Has Carlos published open-source process design kits (PDKs) for nanofabrication?
Yes, his NanoFoundry PDK v2.1 is publicly hosted on GitLab and includes calibrated models for resist development profiles under variable dose gradients, validated across five e-beam tools. It excludes proprietary etch chemistry parameters but provides empirical fit functions for SiO₂:Si selectivity versus RF bias voltage.
Does Carlos Hernández collaborate with materials scientists on novel resist formulations?
He co-leads the Resist Interface Consortium with MIT and IMEC, focusing on photoacid generators with picosecond proton diffusion kinetics. Their 2024 Nature Materials paper introduced a zirconium-oxo cluster resist that achieves 1.8 nm LER at 12 keV, validated via in situ helium ion microscopy during exposure.
What metrology tools does Carlos rely on most for sub-3nm feature verification?
He uses aberration-corrected STEM combined with ptychographic reconstruction, not for imaging alone, but to extract strain tensors from atomic column displacement maps. His group developed custom Python pipelines that correlate those tensors with electrical transport data from nanoprobed test structures, revealing hidden dopant segregation effects.
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Topics

nanofabricationprecision engineeringdevices

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