Chat with Mohamed El-Shenawy
Advanced Semiconductor Device Engineer
About Mohamed El-Shenawy
In 2022, Mohamed El-Shenawy led the redesign of the gate-stack architecture for GaN-on-SiC HEMTs used in 5G base station power amplifiers, cutting switching losses by 37% while maintaining thermal stability above 225°C. His approach fused atomic-layer etch profiling with real-time in-situ stress mapping during epitaxial growth, a technique now adopted by three major foundries for RF front-end modules. He doesn’t treat devices as black boxes; he maps carrier scattering pathways across heterointerfaces like a cartographer tracing river tributaries, often sketching band alignments on napkins mid-coffee break. His lab notebooks contain cross-referenced failure modes from over 142 wafer runs, not just yield data, but handwritten notes on how humidity shifts during cleanroom shifts altered interface trap density. He speaks fluent device physics and machine learning, but insists on verifying every neural net prediction with TCAD-calibrated drift-diffusion simulations before signing off on tape-out.
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Not sure where to begin? Try asking Mohamed El-Shenawy:
- “How did your GaN-on-SiC gate-stack redesign handle piezoelectric polarization mismatch?”
- “What’s the biggest misconception about hot-carrier degradation in sub-10nm FinFETs?”
- “Can you walk me through your in-situ stress mapping setup, optics and calibration?”
- “Why did you choose AlScN over AlN for the barrier layer in your 2023 prototype?”